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SITEK & Semitool Spin Rinse Dryers (SRDs)

SITEK offers new and refurbished Spin Rinse Dryers (SRDs) for many industries and applications. We are industry experts in semiconductor wafer cleaning, contact us with any questions.

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SITEK Rotor Inserts for semiconductor processingSITEK Rotor Insert
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Ribbon Cable used on 328I Controller for Semitool & Rhetech ST Model SRD
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SITEK Rotor InsertSITEK Rotor Insert
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Insert/Adapter: A192-81M Rotor to A182-39M Cassette
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Process Chamber for ST-2300 Semitool & Rhetech SRD

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What is a Spin Rinse Dryer (SRD)?

Spin Rinse Dryers are designed to clean and dry semiconductor wafers after various processing steps. They use a combination of centrifugal force, rinse water, and sometimes heated nitrogen to remove particles and contaminants from the wafer surfaces without leaving water marks or residues.

The primary goal is to achieve high cleanliness levels and dry wafers efficiently to prepare them for subsequent manufacturing steps, such as photolithography, etching, or chemical vapor deposition.

What are the key considerations when selecting a Spin Rinse Dryer?

Key considerations include the types and sizes of substrates to be processed, the level of cleanliness required, throughput needs, and compatibility with existing production lines. Additional factors might include the dryer’s footprint, energy consumption, maintenance requirements, and the ability to customize settings and inserts for specific applications

What types of substrates can be processed in a Spin Rinse Dryer?

SRDs are versatile and can handle a wide range of substrates including semiconductor wafers, glass plates, and other flat substrates used in electronics, photovoltaics, and similar high-tech industries. The specific types and sizes of substrates that can be processed depend on the machine’s design and the available inserts or rotors.