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SKU: 54872
SITEK 280 Spin Rinse Dryer (SRD) for 8″ / 200mm Wafers
The SITEK 280 is a new tabletop Spin Rinse Dryer, ideal for integration into wet benches and compact workstations. This model supports low-profile 8″ / 200mm wafer cassettes, making it a perfect choice for modern fabs and labs with limited space.
It delivers precise rinsing with DI water and efficient drying via heated nitrogen and centrifugal force—all in a highly modular, space-saving design.
All SITEK 280 units are equipped with the advanced SlickDevice S1/F1 controller, offering:
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N₂ Saver for reduced nitrogen use
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SECS/GEM compatibility
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Built-in troubleshooting tools and data logging
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Alerts for static eliminator, heater, and resistivity issues
SITEK Part Number:
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54872
Product Details
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Product Details
For further information, please contact SITEK.
SITEK Spin Rinse Dryers are customizable to your needs, the potential options for the SITEK 280 include:
- Audible Alarm
The process run blue LED on the system status light indicator is replaced with an audible alarm. - N2 Purge Saver
An alternative valve configuration that reduces N2 purge in idle to 0 CFM by eliminating flow to the labyrinth seal and antistatic unit. - Water Recirculation
A tee fitting is included for water recirculation to either drain or any return line to facility recirculation. - Antistatic Feature
A component that static ionizes the process chamber during dry cycles. - Resistivity Probe
Resistivity of the waste water is measured and displayed on the S1 controller. This also allows for Q-rinse, which is a software setting for rinsing to a specific resistivity set point. - Emergency Machine Off (EMO)
An emergency off button on both the front and back of the SRD. - Leak Detection (Requires EMO Feature)
A leak detect sensor is added to the base of the system to EMO if a leak occurs. - FM4910 Fire Retardant Skins
Fire retardant material is used for the outer skins. - Surfactant Dispense
An additional step is included in the software, so the user can hook up a pressurized vessel and dispense surfactant as the first process step. - CO2 Injection
An alternative valve configuration that allows the user to set up a CO2 canister which will mix with the DI water during rinse steps. - Rotor Adapter Inserts
This product adapts the rotor from running a larger substrate size to a smaller one without changing out the rotor. This is recommended for customers running multiple substrate sizes in the same chamber.
