This vacuum wand set is optimized for handling 200mm silicon wafers in wet bench applications. The system is ESD safe and configured for use with an external vacuum source, ensuring safe and reliable operation in semiconductor fabs.

Key Features:

• Normally open vacuum wand

• ESD-safe PEEK tip

• Wand shut-off holder base

• ESD-safe coiled tubing

• Adapter assembly for grounding coil

• Configured for use with external vacuum source

• Holding capacity: 9 lb. @ 22″Hg vacuum source

Applications:

• Ideal for wet benches and substrate handling in wafer processing environments

Customization:
This model is optimized for 200mm silicon wafers. Please contact SITEK, if you need a vacuum wand customized for different wafer sizes or substrate materials.

SITEK Part Number:

• EQP-10848