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SKU: 50159
Semitool 4400-S Spin Rinse Dryer (SRD)
The Semitool 4400 SRD is a Doublestack Spin Rinse Dryer (SRD) with 2 Process Chambers, fully refurbished to ‘Like New’ condition. Two redundant Head Assemblies ensure Uninterrupted Operation, allowing you to perform maintenance on one chamber while the other remains operational. Semitool Spin Rinse Dryers are designed to rinse Semiconductor Substrates with DI water and using hot nitrogen gas and centrifugal force to dry Wafers.
- Capable of processing up to 300mm / 12″ Wafers
- Mounted on Wheeled Base for maximum Flexibility
The Semitool 4400 is a refurbished tool, if you are interested in a brand new SRD, you can find it here!
SITEK Part Number:
- 50159
Product Details
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Product Details
For further information, please contact SITEK.
SITEK Spin Rinse Dryers are customizable to your needs, the potential options for the Semitool 4400 include:
- Audible Alarm
The process run blue LED on the system status light indicator is replaced with an audible alarm. - N2 Purge Saver
An alternative valve configuration that reduces N2 purge in idle to 0 CFM by eliminating flow to the labyrinth seal and antistatic unit. - Water Recirculation
A tee fitting is included for water recirculation to either drain or any return line to facility recirculation. - Antistatic Feature
A component that static ionizes the process chamber during dry cycles. - Resistivity Probe
Resistivity of the waste water is measured and displayed on the S1 controller. This also allows for Q-rinse, which is a software setting for rinsing to a specific resistivity set point. - Emergency Machine Off (EMO)
An emergency off button on both the front and back of the SRD. - Leak Detection (Requires EMO Feature)
A leak detect sensor is added to the base of the system to EMO if a leak occurs. - FM4910 Fire Retardant Skins
Fire retardant material is used for the outer skins. - Surfactant Dispense
An additional step is included in the software, so the user can hook up a pressurized vessel and dispense surfactant as the first process step. - CO2 Injection
An alternative valve configuration that allows the user to set up a CO2 canister which will mix with the DI water during rinse steps. - Rotor Adapter Inserts
This product adapts the rotor from running a larger substrate size to a smaller one without changing out the rotor. This is recommended for customers running multiple substrate sizes in the same chamber.
