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SKU: 54867
SITEK 8300 Spin Rinse Dryer (SRD) for 12″ / 300mm Wafers
The SITEK 8300 is a brand-new Double Stack Spin Rinse Dryer (SRD) with dual independent process chambers. Designed for maximum efficiency, the 8300 model allows uninterrupted operation — perform maintenance on one chamber while the other remains fully functional.
This system is equipped with the SITEK SlickDevice Controller in each chamber, featuring:
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N2 Saver Option to reduce nitrogen usage during idle
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SECS/GEM compatibility
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Built-in troubleshooting assistance
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Spin speed and resistivity display
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Recipe storage for up to 20 processes
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Preventative maintenance tracking
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Alerts for anti-static, heater, or blanket faults
Key Features:
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Brand New, Built by SITEK
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Dual-Chamber Configuration for High Throughput
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Capable of processing wafers up to 300mm / 12″
Important Note:
All double stack Spin Rinse Dryers require two of each selected option (e.g., rotors, static eliminators, etc.), one per chamber.
This system is built to order and can be customized to meet your fab’s specific process requirements.
SITEK Part Number:
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54867
Product Details
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Product Details
For further information, please contact SITEK.
SITEK Spin Rinse Dryers are customizable to your needs, the potential options for the SITEK 8300 include:
- Audible Alarm
The process run blue LED on the system status light indicator is replaced with an audible alarm. - N2 Purge Saver
An alternative valve configuration that reduces N2 purge in idle to 0 CFM by eliminating flow to the labyrinth seal and antistatic unit. - Water Recirculation
A tee fitting is included for water recirculation to either drain or any return line to facility recirculation. - Antistatic Feature
A component that static ionizes the process chamber during dry cycles. - Resistivity Probe
Resistivity of the waste water is measured and displayed on the S1 controller. This also allows for Q-rinse, which is a software setting for rinsing to a specific resistivity set point. - Emergency Machine Off (EMO)
An emergency off button on both the front and back of the SRD. - Leak Detection (Requires EMO Feature)
A leak detect sensor is added to the base of the system to EMO if a leak occurs. - FM4910 Fire Retardant Skins
Fire retardant material is used for the outer skins. - Surfactant Dispense
An additional step is included in the software, so the user can hook up a pressurized vessel and dispense surfactant as the first process step. - CO2 Injection
An alternative valve configuration that allows the user to set up a CO2 canister which will mix with the DI water during rinse steps. - Rotor Adapter Inserts
This product adapts the rotor from running a larger substrate size to a smaller one without changing out the rotor. This is recommended for customers running multiple substrate sizes in the same chamber.
