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SKU: 54866
SITEK 4300 Spin Rinse Dryer (SRD) for 12″ / 300mm Wafers
The SITEK 4300 is a brand new, freestanding Spin Rinse Dryer mounted on a mobile wheeled base for flexible installation and efficient use of space. Designed to rinse semiconductor substrates with DI water and dry them using hot nitrogen gas and centrifugal force, the SITEK 4300 supports up to 300mm / 12″ wafers using high-profile cassettes.
Ideal for fabs running larger wafers, this single-chamber SRD provides standalone functionality and mobility, with room for optional storage or components beneath the frame.
Each new unit comes equipped with SITEK’s advanced SlickDevice S1/F1 controller, providing:
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N₂ Saver for reduced nitrogen consumption
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SECS/GEM compatibility
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Built-in troubleshooting and data logging
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Alerts for anti-static, heater, and resistivity issues
SITEK Part Number:
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54866
Product Details
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Product Details
For further information, please contact SITEK.
SITEK Spin Rinse Dryers are customizable to your needs, the potential options for the SITEK 4300 include:
- Audible Alarm
The process run blue LED on the system status light indicator is replaced with an audible alarm. - N2 Purge Saver
An alternative valve configuration that reduces N2 purge in idle to 0 CFM by eliminating flow to the labyrinth seal and antistatic unit. - Water Recirculation
A tee fitting is included for water recirculation to either drain or any return line to facility recirculation. - Antistatic Feature
A component that static ionizes the process chamber during dry cycles. - Resistivity Probe
Resistivity of the waste water is measured and displayed on the S1 controller. This also allows for Q-rinse, which is a software setting for rinsing to a specific resistivity set point. - Emergency Machine Off (EMO)
An emergency off button on both the front and back of the SRD. - Leak Detection (Requires EMO Feature)
A leak detect sensor is added to the base of the system to EMO if a leak occurs. - FM4910 Fire Retardant Skins
Fire retardant material is used for the outer skins. - Surfactant Dispense
An additional step is included in the software, so the user can hook up a pressurized vessel and dispense surfactant as the first process step. - CO2 Injection
An alternative valve configuration that allows the user to set up a CO2 canister which will mix with the DI water during rinse steps. - Rotor Adapter Inserts
This product adapts the rotor from running a larger substrate size to a smaller one without changing out the rotor. This is recommended for customers running multiple substrate sizes in the same chamber.
