The UTE SCS i124 is a high-performance mask cleaner specifically designed for semiconductor production, delivering exceptional submicron cleaning of photomasks, wafers, and other critical substrates. This reliable and cost-effective system integrates a broad range of proven cleaning technologies, ensuring precise and efficient results for demanding applications.

Key Features:

• Customizable Cleaning Options: Equipped with High-Pressure DI, Atomizing Mist Nozzle, Brushes, Megasonic Pies, and Nozzles to meet diverse cleaning needs.
• Efficient Drying Techniques: Combines variable spin speeds, optional heated DI, nitrogen assist, or heat lamp for rapid and thorough drying.
• Advanced Microprocessor Control: Allows precise process customization and retains up to 10 process programs for operational flexibility.

Purpose-built for the semiconductor industry, the SCS i124 is the ultimate solution for maintaining photomask and substrate integrity with unparalleled cleaning performance.