Description: Ultra t Equipment Co. SCS 112 Substrate Cleaning System
(Ultra t SCS 112 Cleaner)
Ultra t Equipment Co. SCS 112 Substrate Cleaning System
* EQP-00877 * Up to Eight (8) Inch Wafer Compatibility including Unmounted Wafers as well as Tape Ring and Film Frame mounted Wafers * Programmable Controller * Adjustable spin speeds adjustable * Up to 9" square (mask) capability * Oscillating High Pressure D.I. Water Fan Jet Assembly, adjustable to 2500 PSI, for Effective and Efficient Cleaning. Adjustment via regulator on pump * Nitrogen Blow-off for Rapid and Effective Dry * Infrared Heat Lamp for Complete Drying * No vacuum hold down * Efficient Chamber Exhaust and Drain * Built-in Exhaust Blower * Built-in Safety Interlocks and Positive Lid Locking During Process Cycle
Ultra-t, ultra t
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