Description: Nanometrics Nanospec AFT 210UV (Nanospec AFT 210UV) Nanometrics AFT 210UV* Nanometrics 210UV* Film Measurement System * Stage - 4" wafers - larger stage can be supplied* Range of Thicknesses: 100 to 500,000 angstroms* Utilizing the UV options you can measure down to appr. 10 Angstroms on certain films * Spot Size: 50 um with 5x objective, 25 um with 10x objective, 6.5 um with 40x objective * Objectives: Olympus MS Plan 5, MS Plan 10, ULWD MS Plan 50 * Optional Objectives are Olympus M5X and M100X* Film Types: Oxide on Silicon; Nitride on Silicon; Negative Resist on Silicon; Polysilicon on Oxide; Negative Resist on Oxide; Nitride on Oxide; Polyimide on Silicon; Positive Resist on Silicon; Positive Resist on Oxide * Reflectance Mode * Thick Films, Reproducibility: 5A ¿ 5% depending upon the film type* Typical Measurement Time: 2.5 seconds. * Typical Measurement Time in UV mode: 10 seconds