Description: Ultratech 2066 Mask Cleaner
(Ultratech /Semi Sys Model 2066)
Ultratech/Semiconductor Sys Model 2066 High pressure Substrate cleaner
* EQP-00747 * Uses non abrasive high pressure jets to effectively clean particulates from photomasks & wafers. * Water pressure adjustable up to over 2,000 psi with oiless high pressure pump. * Heat lamp and N2 Blow off for optimal drying capabilities. * Programmable spray and dry times. * Top diameter opening 12" * Can accommodate up to 7" square or 8" round substrates. * 115 V, 60 Hz, 5A.
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