Description: Matrix 303 Etcher
(Matrix Model 303 Etcher)
Matrix 303 Etcher
*Programmable microprocessor controlled system *Capable of handling wafer sizes from 2 in. to 6 in *Cassette loading *ENI OEM-6XL 13.56 Mhz *600W RF Generator *Temperature controlled *Previous gases used: NF3, O2, N2, He. 200/240V, 1 Ph, 50/60 Hz *Used for Isotropic etches such as Nitride, Poly and Oxides
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