Description: Tegal 415 Plasma Etchers
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Tegal 415 Plasma Etchers
*Barrel Type Plasma Asher Batch loaded *Barrel type plasma reactor designed specifically for use as a fast stripper of photoresist for the fabrication of semiconductor wafers *Achieves its strip rates by providing a large rate of gas conduction up to 300W of RF Energy *Reaction Chamber: Aluminum 12¿ (30.48 cm) deep *Impedance Matching: Manual or automatic
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