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Description: Nanometrics Nanospec 6100
(Nanometrics 6100)
Nanometrics Nanospec 6100
The NanoSpec 6100 is a fast, reliable, low cost tabletop film thickness and mapping system that provides a broad range of measurement capabilities for thin film metrology. The 6100 utilizes non-contact spectroscopic reflectometry to measure sites as small as 10¿m in diameter, and is suitable for production control or lab use. The computerized 1¿m resolution stage coupled to a robust autofocus system enables automatic generation of film thickness uniformity maps, which are displayed in high resolution color with contour and 3D formats. The system handles wafer substrates in the range of 75 to 300 mm in diameter and photomasks from 5 to 9 inches square. The 6100 measures film thickness in the range of 200Š- 30¿m with the visible light source (400 to 800nm halogen lamp) and 35Š- 30¿m with optional UV light source (210 to 400nm deuterium lamp). The upper thickness range can be extended to 70¿m with the thick film option.
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