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Description: Ultra t Equipment Co. SCS 112 Substrate Cleaning System
(Ultra t SCS 112 Cleaner)
Ultra t Equipment Co. SCS 112 Substrate Cleaning System
* EQP-00877
* Up to Eight (8) Inch Wafer Compatibility including Unmounted Wafers as
well as Tape Ring and Film Frame mounted Wafers
* Programmable Controller
* Adjustable spin speeds adjustable
* Up to 9" square (mask) capability
* Oscillating High Pressure D.I. Water Fan Jet Assembly, adjustable to
2500 PSI, for Effective and Efficient Cleaning. Adjustment via regulator
on pump
* Nitrogen Blow-off for Rapid and Effective Dry
* Infrared Heat Lamp for Complete Drying
* No vacuum hold down
* Efficient Chamber Exhaust and Drain
* Built-in Exhaust Blower
* Built-in Safety Interlocks and Positive Lid Locking During Process Cycle
Ultra-t, ultra t
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