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Description: Ultra t Equipment Co. SWC-111 Mask Cleaner
(Ultra t Equipment SWC-111 )
Ultra t Equipment SWC111 Mask Cleaner
* Up to Eight (8) Inch Wafer Compatibility including Unmounted Wafers as
well as Tape Ring and Film Frame mounted Wafers
* Up to 6 programmable recipes
* Spin speeds adjustable from front potentiometers
* Up to 9" square (mask) capability
*Oscillating High Pressure D.I. Water Fan Jet Assembly, adjustable to
2500 PSI, for Effective and Efficient Cleaning. Adjustment via regulator
on pump
* Nitrogen Blow-off for Rapid and Effective Dry
* Infrared Heat Lamp for Complete Drying
* Built in Vacuum Wafer Hold-down
* Efficient Chamber Exhaust and Drain
* Built-in Exhaust Blower
* Built-in Safety Interlocks and Positive Lid Locking During Process Cycle
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