Description: Nanometrics Nanospec AFT 210
(Nanometrics 210)
Nanometrics AFT 210 * Nanometrics 210 * Film Measurement System * Stage - dual 4" wafers - larger stage can be supplied * Range of Thicknesses: 100 to 500,000 angstroms, * Spot Size: 50 um with 5x objective, 25 um with 10x objective, 6.5 um with 40x objective * System includes an Olympus M10x and M40x objective. * Optional Objectives are Olympus M5X and M100X * Film Types: Oxide on Silicon; Nitride on Silicon; Negative Resist on Silicon; Polysilicon on Oxide; Negative Resist on Oxide; Nitride on Oxide; Polyimide on Silicon; Positive Resist on Silicon; Positive Resist on Oxide * Reflectance Mode * Thick Films, Reproducibility: 5A ± 5% depending upon the film type * Typical Measurement Time: 2.5 seconds. * Pictures may be used for reference only
Note: Our current system in stock does not have the autoloader. Just a manual load stage.
|