Search Our Site
   
  Advanced Search
Shop by Brand
Shop by Product Category

Current: Catalog : Nanometrics Nanospec AFT 210 (Nanometrics 210)


Product Details
Manufacturer: Nanometrics Email Us
Want to Service
Want to Sell
Related Products

Mfg. Part#: Nanometrics 210
Condition: Refurb
Asking Price: Contact Sales
Inventory Number: 50284

Description: Nanometrics Nanospec AFT 210 (Nanometrics 210)

 

 

Nanometrics AFT 210
* Nanometrics 210
* Film Measurement System
* Stage - dual 4" wafers - larger stage can be supplied
* Range of Thicknesses: 100 to 500,000 angstroms,
* Spot Size: 50 um with 5x objective, 25 um with 10x 
   objective, 6.5 um with 40x objective
* System includes an Olympus M10x and M40x objective.
* Optional Objectives are Olympus M5X and M100X
* Film Types: Oxide on Silicon; Nitride on Silicon; Negative
   Resist on Silicon; Polysilicon on Oxide; Negative Resist on
   Oxide; Nitride on Oxide; Polyimide on Silicon; Positive Resist
   on Silicon; Positive Resist on Oxide
* Reflectance Mode
* Thick Films, Reproducibility: 5A ± 5% depending upon the
   film type
* Typical Measurement Time: 2.5 seconds.

* Pictures may be used for reference only

Note: Our current system in stock does not have the autoloader. Just a manual load stage.

 

 



Nanometrics Nanospec AFT 210






Specifications







Specification Url  
Nano 210  
Nanometrics 210 Source Insp 7-30-14 Nanometrics 210 Source Insp 7-30-14  
Nanometrics 210 Specifications Nanometrics 210 - Specification.pdf  



Due to equipment location and/or prior sale, some pictures are used for "reference only."
Sitek Process Solutions, Inc. Phone: 916.797.9000 Fax: 916.797.9009
233 Technology Way, Building A-3, Rocklin, CA 95765.
Powered By Corezon
Privacy Policy