|
Description: Rudolph FE IV Ellipsometer
(FE IV Ellipsometer)
Specifications:
System: The Rudolph FE III series is a focused beam ellipsometer for simultaneous multi-angle measurements. In addition, multi-wavelength measurement capabilities are available using the optional second light source on the Rudolph FE III-D.
Light Source:
632.8 nm HeNe Laser, 780 nm laser diode (optional second light source)
Spot Size:
12X24 um test site: de-skew only 125 um, site by site 50 um
Pattern Recognition:
Optional pattern recognition, edge or gray scale detection, manual or auto de-skew, re-teach
Wafer Handling:
3-axis robot with random access to three cassettes for 100 mm, 150 mm, and 200 mm wafers
Pre-aligner:
Virtual flat/ notch finder, x, y, centering +/-50 um, theta +/-0.1 deg., de-skew +/-5 um
Stage:
Accuracy: 7um over 200 mm, repeatability: +/-1 um
Uptime:
>95%; MTBF: >1500 hours
|
Privacy Policy