Description: Ultratech 603 Cleaner
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Ultratech 603 Mask/Substrates cleaner
* Uses non-abrasive high-pressure jets to effectively clean particulates from photomasks & wafers. * Water pressure adjustable up to 2,500 psi with high pressure pump. * Can accommodate different substrates such as: * Masks (multiple sizes) * Wafers * Spindle speeds up to 3,000 rpm. * Provides 2-micron filtration. * Power: 115 V, 60 Hz, 5A.
Note: We need to know actual substrate prior to quotation. There are different "Chucks" to accommodate different substrates.
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