Description: Karl Suss MA 6 Aligner
(MA 6)
Large Gap Mask Aligner ¿ System is in the MA6 configuration with top side alignment ¿ Designed to align wafer to mask with separations of up to 300 nm using the included ¿Grab Image¿ option ¿ Has proximity, contact and hard contact modes ¿ Mask holders included are 5¿ x 5¿ and 6¿ x 6¿ ¿ Manual load and align will handle 3¿ to 6¿ wafers ¿ Uses wedge effect calibration on chuck for all modes of exposure ¿ Has single or multiple exposure modes ¿ 500 Watt Hg Lamp powered by Karl Suss CIC500 supply.
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