Description: MRC 903M Sputtering System
(903M)
3 Target DC Sputtering System with Sputter Etch. Techware Systems PC controller. Advanced Energy MDX-10K DC Magnetron Power Supply and RFX-600 RF Etch Supply with TCM Match Controller. 12¿ x 12¿ substrate carrier. Three DC Targets 4 3/4¿ x 14 7/8.¿ CTI Cryopump with compressor and roughing pump.
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