Description: MRC 603 Sputtering/Vertical-Load Lock
(603)
3 Target RF & DC Side Sputtering System with Etch. CRT screen monitoring with keyboard parameter control. Three targets 5¿ x 15.¿ Sputter etch capability. Quartz substrate heaters, substrate temperature adjustable to 400¿C. Substrate carrier 13¿ x 13.¿ Cryo pump and roughing pump.
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